Continuous-Time Modeling and Analysis of Particle Beam Metrology
Particle beam microscopy (PBM) performs nanoscale imaging by pixelwise capture of scalar values representing noisy measurements of the response from secondary electrons (SEs) integrated over a dwell time. Extended to metrology, goals include estimating SE yield at each pixel and detecting differences in SE yield across pixels; obstacles include shot noise in the particle source as well as lack of knowledge of and variability in the instrument response to single SEs.